July 20. 2022 - Pfaff Vacuum, one of the world's leading suppliers of vacuum technology, is once again introducing the new multi-stage Roots pump ACP 90.
Designed for oil-free and particle-free applications in the pressure range from atmospheric to 3x10-2 hPa, the pump meets the needs of users requiring high clean drying vacuum environments for drying, sterilizing, coating, and semiconductor and R&D applications.
as well as semiconductor and R&D applications that require high clean drying vacuum environments.
The unique pumping unit design of the new multi-stage Roots pump ACP 90 is designed to withstand frequent evacuations, enhancing the ruggedness of the pump.
Among other things, the high-value materials used, such as aluminum plating and stainless steel, increase the resistance of these pumps to mildly corrosive gases.
Not only that, the ACP 90 also has a high dilution capacity for ambient air or neutral gases, making it very suitable for use in dry applications,
high humidity environments or for pumping large quantities of condensable gases in large insulated volumes.
Jean-Philippe Briton, Product Manager at Pfaff Vacuum, said: “We are very proud to have realized an intelligent management between the inlet stage and the pump outlet.
This management allows high pumping speeds at high pressures, which is crucial when pumping large volumes.
Moreover, with an extremely low power consumption of 2 kW at atmospheric pressure, the ACP 90 can be a perfect energy-saving solution for this type of use.”
In addition, the new multistage Roots pump ACP 90 is CE and UL/CSA compliant.
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